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Press Release
- [February 3, 2010]
e-Shuttle Realize 65nm e-beam IC Prototyping Service - World's first e-beam direct-write of interconnect layers - - [February 24, 2009]
eBeam Initiative Aims to Increase Design Starts and Reduce Time-to-market in Semiconductor Industry - [September 30, 2008]
e-Shuttle to Feature its Electron-Beam Direct Write (EBDW) Technology at GSA Suppliers Expo Oct. 2 in Santa Clara - [September 26, 2008]
e-Shuttle and Hong Kong Science and Technology Parks Collaborate to Provide Silicon Shuttle Services for Asian Start-ups
Topics
- [May 27, 2008]
Presentaion at EIPBN in Portland on "Application and Technology of EBDW" ( Sugatani ) - [May 14, 2008]
Exhibition at ITE-GSA International Semiconductor Forum in London. - [February 29, 2008]
Electronics Design,Strategy, News(EDN) reported e-Shuttle' ebeam - [February 26, 2008]
Presenation at SPIE Advanced lithography on "EBDW technology for EB shuttle at 65nm node or beyond".(Maruyama ) - [October 24, 2007]
President Tsuchikawa made presentation at 4th ISMI Symposium on Manufacturing Effectiveness. - [October 16, 2007]
e-Shuttle, Inc. appeared in Semiconductor International Web magazine.