e-Shuttle

NEWS

• [June 25, 2010]
  e-Shuttle Limited Announces Executive Appointment and Resignation
• [Feb. 03, 2010]
  e-Shuttle Realizes 65nm e-beam IC Prototyping Service - World's first e-beam direct-write of interconnect layers -
• [Feb. 24, 2009]
  eBeam Initiative Aims to Increase Design Starts and Reduce Time-to-market in Semiconductor Industry
• [Oct. 09, 2008]
  e-Shuttle to Feature its Electron-Beam Direct Write (EBDW) Technology for LSL production without masks
• [Sep. 30, 2008]
  e-Shuttle to Feature its Electron-Beam Direct Write (EBDW) Technology at GSA Suppliers Expo Oct. 2 in Santa Clara
• [Sep. 26, 2008]
  e-Shuttle and Hong Kong Science and Technology Parks Collaborate to Provide Silicon Shuttle Services for Asian Start-ups

TOPICS

• [July 13, 2011]
  Number of Prototyping Projects We have Implemented and List of Papers Described Using Devices Manufactured by e-Shuttle Prototyping Service in Newly Added Page Named "e-Shuttle Prototyping Achievement".
• [July 08, 2010]
  "Glossary"page added.
• [July 08, 2010]
  In "Our Hi-Tech" Page, Article "Cleaning methods for EB Lithography System" added.
• [June 21, 2010]
  In Fujitsu Semiconductor's technology information magazine "FIND Vol.28 No.2 2010", the article "LSI prototyping service with 65nm EBDW technology capable of small-volume production" issued.
• [June 17, 2010]
  "Our Hi-Tech" page, Article "CP Method and VSB Method" added.
• [May 31, 2010]
  "Our Hi-Tech" page added and Article "Principles and Applications of Electron Beam Lithography" issued.
• [May 10, 2010]
  ADVANTEST CORPORATION website introduces e-Shuttle, Inc. as "Application Example" and provides the link to our website.
• [Dec. 28, 2009]
  Headquaters moved to Shin-Yokohama.
• [May 27, 2008]
  Presentaion at EIPBN in Portland on "Application and Technology of EBDW"
• [May 14, 2008]
  Exhibition at ITE-GSA International Semiconductor Forum in London.
• [Feb. 29, 2008]
  Electronics Design,Strategy, News(EDN) reported e-Shuttle' ebeam
• [Feb. 26, 2008]
  Presenation at SPIE Advanced lithography on "EBDW technology for EB shuttle at 65nm node or beyond".
• [Oct. 24, 2007]
  President Tsuchikawa made presentation at 4th ISMI Symposium on Manufacturing Effectiveness.
• [Oct. 16, 2007]
  e-Shuttle, Inc. appeared in Semiconductor International Web magazine.
• [July 19, 2007]
  Our web site issued