[e-Shuttle] e-Shuttle

NEWS

[June 25, 2010]
e-Shuttle Limited Announces Executive Appointment and Resignation
[Feb. 03, 2010]
e-Shuttle Realizes 65nm e-beam IC Prototyping Service - World's first e-beam direct-write of interconnect layers -
[Feb. 24, 2009]
eBeam Initiative Aims to Increase Design Starts and Reduce Time-to-market in Semiconductor Industry
[Oct. 09, 2008]
e-Shuttle to Feature its Electron-Beam Direct Write (EBDW) Technology for LSL production without masks

[July 08, 2010] New !
"Glossary"page added.
[July 08, 2010]
In "Our Hi-Tech" Page, Article "Cleaning methods for EB Lithography System" added.
[Jun. 21, 2010]
In Fujitsu Semiconductor's technology information magazine "FIND Vol.28 No.2 2010", the article "LSI prototyping service with 65nm EBDW technology capable of small-volume production" issued.
[Jun. 17, 2010]
"Our Hi-Tech" page, Article "CP Method and VSB Method" added.
[May. 31, 2010]
"Our Hi-Tech" page added and Article "Principles and Applications of Electron Beam Lithography" issued.
[May. 10, 2010]
ADVANTEST CORPORATION website introduces e-Shuttle, Inc. as "Application Example" and provides the link to our website.

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