Company Profile

Company Name: e-Shuttle, Inc.

Address

Nomura Fudosan Shin-Yokohama Building 10-23,
Shin-Yokohama, 2-chome, Kohoku-Ku, Yokohama, Kanagawa

map

Board of Directors

President Yoji Hino Member of the Board and Corporate Senior Vice President
of FUJITSU SEMICONDUCTOR LIMITED
Executives Haruyoshi Yagi Member of the Board and Corporate Senior Executive Vice President
of FUJITSU SEMICONDUCTOR LIMITED
Yuichi Kurita Board Director, CFO and Senior Executive Officer of ADVANTEST Corporation
Corporate Auditor Ryuichi Saitoh Director of Accounting Dept.I, Corporate Finance Div.
FUJITSU SEMICONDUCTOR LIMITED
Takayuki Arai Deputy Manager, Accounting Department and Manager, Accoutning Section, Corporate Administration Group, ADVANTEST Corporation

Office Location

Headquarters Nomura Fudosan Shin-Yokohama Building 10-23,
Shin-Yokohama, 2-chome, Kohoku-Ku, Yokohama, Kanagawa
Development office Akiruno Technology Center 50 Huchigami, Akiruno-shi, Tokyo, Japan
Manufacturing plant Mie Plant 1500 Mizono, Tado-cho, Kuwana-shi, Mie-ken, Japan

Corporate History

Nov. 2006 e-Shuttle Inc. is jointly established by FUJITSU Ltd. and Advantest Corporation.
Dec. 2006 Shuttle (MPW) service is begun in cooperation with FUJITSU Ltd. (currently Fujitsu Microelectronics Ltd.)
Feb. 2007 EBDW equipment (the first machine) is introduced -> the development of EBDW process is started.
Apr. 2007 The partner contract is concluded with LSI vendors and mask vendors. -->The expansion of sales route is promoted.
Apr. 2007 The joint development agreement on design for EB (DFEB) is concluded with the D2S Inc.** the development of design technique suitable for EBDW c Productivity improved.
Oct. 2007 Shuttle (MPW) first order is received from the university
Jan. 2008 The shipment of shuttle die manufactured with Electronic Beam Direct Drawing (EBDW) is started.
Mar. 2008 The shipment of COT die by EBDW is started.
May. 2008 The second EB equipment (Refer to the photograph) is introduced -> EBDW process capacity is increased.
Sep. 2008 The partner contract is concluded with Hong Kong Science & Technology Parks Co. (HKSTP) for LSI prototyping for the universities and companies in Asia.
Oct. 2008 e-Shuttle Inc. is approved as a manufacturing vender of the next generation circuit architecture technology development business by Semiconductor Technology Academic Research Center (STARC), and receives the order of the die prototyping for 65 nm generation process research and development.
Feb. 2009 The operation of test die manufactured with DFEB has been confirmed (for the improvement of EBDW productivity)
Mar. 2009 The eBeam Initiative is established and e-Shuttle participates it. -> Ecosystem organization using Maskless lithography with DFEB
May. 2009 EBDW technology is applied to the interconnect process of 65 nm technology.
Dec. 2009 Headquaters are moved to Shin-Yokohama area.